CL-XDF Type Micro Pulling Down Single Crystal Furnace

CL-XDF Type Micro Pulling Down Single Crystal Furnace
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CL-XDF series single crystal furnace is the equipment for making high quality oxide solid single crystal materials (such as LN, LT, YAG, YSO, LYSO, sapphire, etc.) by micro pull down method. It can be operated under various atmosphere conditions.
This series of equipment realizes the growth of tiny crystal rods by growing crystals downward. The motion system of this series of equipment adopts high-precision stepping motor drive control to directly drive the stepping motor, which can realize a wide range of variable speed adjustment and ultra-low speed operation. This series of equipment can well ensure the smoothness, uniformity and reliability of the operation, no crawling for a long time running, small vibration.
This series of equipment adopts high-precision medium-frequency induction heating power supply, and uses computer to control the furnace temperature, realizing high-precision and high-sensitivity temperature control, ensuring that the crystals grow in accordance with the preset shapes and sizes, and the crystals have small error in external dimensions and high internal quality.
This series of equipment after the completion of the introduction of the crystal, can realize the crystal growth of the whole process of control, safe and reliable, and can be abnormal state (water cooling system abnormality, growth rate abnormality, power failure and other faults) for automatic processing.
This series of single crystal furnace can be configured according to the user’s process requirements for high, medium and low-grade configuration, can be configured according to the user’s needs for other extended functions.

CL-XDF Equipment parameters (" √ "is standard, " ○ "is optional)

ModleUnitCL-XDF-400CL-XDF-500
Effective Puller travel distancemm550√550√
Pulling ratemm/h0.1-6000√0.1-6000√
Pulling system jump (pulling rate 1mm/h)mm0.001√0.001√
Rotating raterpm\\
Weight measurement rangekg1√1√
Scale display resolutionmg10√10√
PowerKw0-20√0-20√
Power accuracy1‰√1‰√
Air filling pressureMpa0-0.05√0-0.05√
VacuumPa≤10√≤10√
VacuumPa≤5×10-3○≤5×10-3○
Chamber sizemmΦ400×400√Φ500×600√
Overall size(L×W×H)mm2600×1100×23002600×1100×2500
Overall weightKg600600

CL-XDF Equipment configuration (" √ "is standard, " ○ "is optional)

CL-XDF-400CL-XDF-500
Furnace chamber sizeΦ400×400√Φ500×600√
Control cabinetCRY-K-Ⅰ√CRY-K-Ⅰ√
Power supplyATECD20√ATECD20√
Pulling mechanismCRY-TL-550√CRY-TL-550√
FrameCRY-LJ-500√CRY-LJ-500√
VMBCRY-Q-Ⅰ√CRY-Q-Ⅰ√
Weighing platformCRY-CZ-1√CRY-CZ-1√
Vacuum gaugeZDF series√ZDF series√
BellowsKF series√KF series√
Pulling motor and driver86HS45√86HS45√
EncoderZKH58√ZKH58√
IPCIPC820 series√IPC820 series√
UPS power supply for controlC1LKRS√C1LKRS√
Welded bellowXT70×50-620√XT70×50-620√
Seed rodØ8√Ø8√
Mechanical pumpRVP-9√RVP-9√
CCD√√
warm up√√
CrucibleΦ16√Φ16√

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